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SILICON PLASMA ETCHING IN THE NANOTECHNOLOGY ERA: AN INDUSTRIAL PERSPECTIVE

Category: 2013 , NPSS Events

“Etching, Lithography, and Moore’s law” were blank spots for the audience before the session given by Professor Ali Abdu who had worked as a senior engineer at Intel. The session stared with a brief discussion of plasma and nano-fabrication technology. Differences between chemical etching and mechanical etching were introduced.

After presenting challenges facing the continuity of Moore’s Law, shallow trench process development was addressed as well as the challenges facing it including cost, safety and repeatability.

Project Details

  • Event: http://goo.gl/mAqiOU

  • Lectures: Presentation not available to public due to copyrights. If you’d like to have a copy, contact us.